Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Line 76: Line 76:
=== Process D4 ===
=== Process D4 ===


After a few years in its original configuration, we decided to upgrade Pegasus 1 with the [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange|High flow plenum]] upgrade to improve the fast switching performance. As a result, the original recipe Process D was changed to Process D4 with faster cycles. The process parameters are listed in the table below.
After a few years in its original configuration, we decided to [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange|'''upgrade Pegasus 1''']] to improve the fast switching performance. As a result, the original recipe Process D was changed to Process D4 with faster cycles. The process parameters are listed in the table below.


{| {{table}}
{| {{table}}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/picoscope"