Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions

Jmli (talk | contribs)
Jmli (talk | contribs)
Line 98: Line 98:


=== Publications on the CORE process ===
=== Publications on the CORE process ===
<span id="anchor_CORE1"></span>


; Nguyen, V. T. et al.: On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand
; Nguyen, V. T. et al.: On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand
Line 103: Line 104:
: https://doi.org/10.1116/6.0000196
: https://doi.org/10.1116/6.0000196


<span id="anchor_CORE1"></span>
; Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature
; Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature
: 2020 ECS J. Solid State Sci. Technol. 9 024002
: 2020 ECS J. Solid State Sci. Technol. 9 024002