Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

Revision as of 15:09, 5 April 2023 view source Jehem (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip 1,893 edits →Aligner: Maskless 02 ← Older edit		Revision as of 08:19, 11 April 2023 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,528 edits →Aligner: Maskless 02 Newer edit →
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	==Aligner: Maskless 02==		==Aligner: Maskless 02==
	MLA150 WMII maskless aligner from Heidelberg Instruments GmbH.		MLA150 WMII maskless aligner from Heidelberg Instruments GmbH (installed 2019 as WMI (0.6µm resolution), rebuilt to WMII 2023).