Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions

Revision as of 15:59, 22 March 2023 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits →An overview of the performance of IBE/IBSD Ionfab 300 and some process related parameters ← Older edit		Revision as of 13:59, 24 March 2023 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits →IBE/IBSD Ionfab 300: milling and dry etching Newer edit →
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	[[Image:IBE_IBSD_udstyret_i_RR1.jpg\|300x300px\|thumb\|IBE and IBSD: positioned in cleanroom A-1, {{photo1}}]]		[[Image:IBE_IBSD_udstyret_i_RR1.jpg\|300x300px\|thumb\|IBE and IBSD: positioned in cleanroom A-1, {{photo1}}]]

	IBE/IBSD Ionfab 300 was ~~manufactored~~ by Oxford Instruments Plasma Technology. It was installed at Nanolab in 2011.		IBE/IBSD Ionfab 300 was manufactured by Oxford Instruments Plasma Technology [https://plasma.oxinst.com/products/ion-beam/ionfab]. It was installed at Nanolab in 2011. It was originally installed with the capability of doing both IBE and IBSD. In 2022 we have decommissioned the IBSD part.