Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

Revision as of 12:17, 24 March 2023 view source Jehem (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip 1,915 edits →Back Side Alignment ← Older edit		Revision as of 12:17, 24 March 2023 view source Jehem (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip 1,915 edits →Back Side Alignment Newer edit →
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	'''Camera field of view (W x H):''' 640 µm x 480 µm		'''Camera field of view (W x H):''' 640 µm x 480 µm

	[[Image:MLA150_BSA_Backside.JPG\|center\|300px\|thumb\|Image of a BSA alignment mark during alignment. The mark is ~~300µm~~ wide. The blue cross-hair is ~~~18µm~~. Screenshot by Thomas Anhøj @ DTU Nanolab, 2019.]]		[[Image:MLA150_BSA_Backside.JPG\|center\|300px\|thumb\|Image of a BSA alignment mark during alignment. The mark is 300 µm wide. The blue cross-hair is ~18 µm. Screenshot by Thomas Anhøj @ DTU Nanolab, 2019.]]