Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
| Line 159: | Line 159: | ||
==Large defocus range== | ==Large defocus range== | ||
The standard range for the defocus parameter is -10 to 10, but a special feature allows to extend this range to -25 to 25, which may be useful when exposing thick resist. The large defocus range feature is | The standard range for the defocus parameter is -10 to 10, but a special feature allows to extend this range to -25 to 25, which may be useful when exposing thick resist. The large defocus range feature is set in the resist template, and can only be accessed by choosing the 'Special - Large defoc range' resist template during the job setup. The dose must be set manually, as this is an otherwise empty resist template. | ||
<br clear="all" /> | <br clear="all" /> | ||