Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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'''Speed vs. area:''' | '''Speed vs. area:''' | ||
During exposure of a stripe the stage moves at a constant speed. Each stripe thus includes a certain movement overhead for acceleration and deceleration. As the stripes get shorter, this overhead becomes more significant, and the normal writing speed is no longer achieved. For smaller samples, the writing speed of Aligner: Maskless 02 drops below the specified writing speed for a full 100 x 100 mm substrate. | During exposure of a stripe the stage moves at a constant speed. Each stripe thus includes a certain movement overhead for acceleration and deceleration. As the stripes get shorter, this overhead becomes more significant, and the normal writing speed is no longer achieved. For smaller samples, the writing speed of Aligner: Maskless 02 drops below the specified writing speed for a full 100 x 100 mm substrate. | ||
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'''Speed vs. dose:''' | '''Speed vs. dose:''' | ||
The writing speed remains almost constant up to a dose of 200 mJ/cm<sup>2</sup>. The writing speed is 50% at a dose of ~1000 mJ/cm<sup>2</sup>. | The writing speed remains almost constant up to a dose of 200 mJ/cm<sup>2</sup>. The writing speed is 50% at a dose of ~1000 mJ/cm<sup>2</sup>. | ||