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Specific Process Knowledge/Etch/RIE (Reactive Ion Etch): Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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==Equipment performance and process related parameters - HAS BEEN DECOMMISSIONED==
==Equipment performance and process related parameters ==


{| border="2" cellspacing="0" cellpadding="2"  
{| border="2" cellspacing="0" cellpadding="2"  
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>RIE1 - '''HAS BEEN DECOMMISSIONED'''</b>
|style="background:WhiteSmoke; color:black"|<b>RIE1 - '''HAS BEEN DECOMMISSIONED'''</b>
|style="background:WhiteSmoke; color:black"|<b>RIE2</b>
|style="background:WhiteSmoke; color:black"|<b>RIE2 - '''HAS BEEN DECOMMISSIONED'''</b>
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Purpose  
!style="background:silver; color:black;" align="center" width="60"|Purpose  
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