Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Large defocus range== | ==Large defocus range== | ||
The standard range for the defocus parameter is -10 to 10, but a special feature allows to extend this range to -25 to 25. The large defocus range feature is set in the resist template, and can only be accessed by choosing the 'Special - Large defoc range' resist template during the job setup. The dose must be set manually, as this is an otherwise empty resist template. | The standard range for the defocus parameter is -10 to 10, but a special feature allows to extend this range to -25 to 25. The large defocus range feature is set in the resist template, and can only be accessed by choosing the 'Special - Large defoc range' resist template during the job setup. The dose must be set manually, as this is an otherwise empty resist template. | ||
This feature works with both pneumatic and optical autofocus, in the full range for both. | |||
It is possible to combine this feature with other features, such as high aspect ratio mode. | |||
==High Aspect Ratio (DOF) mode== | ==High Aspect Ratio (DOF) mode== | ||