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Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
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{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
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| [[image:9500calib1.png|915px]]
| [[image:9500calib1.png|600px]]
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| colspan="1" style="text-align:center;|
| colspan="1" style="text-align:center;|
2", 4" and 6" substrates can be coated with AR-P6200.09 (CSAR) on Spin Coater: Gamma E-beam & UV. Photo: Thomas Pedersen.
Select and restore the correct condition file. Image: Thomas Pedersen.
|}
|}


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