Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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=System calibration= | =System calibration= | ||
After cassette transfer the system has to be calibrated with the chosen beam current profile. This is done in a mostly automated sequence with only minute input from the user. | After cassette transfer the system has to be calibrated with the chosen beam current profile. This is done in a mostly automated sequence with only minute input from the user. The sequence is explained in detail in the following but it overview it is | ||
*Select and restore the system to the chosen beam current profile | |||
*System self check | |||
**Execute a current measurement | |||
**Execute absorbed electron mark detection | |||
**Execute backscatter electron mark detection | |||
*Execute self calibration routine | |||
**Execute '''daily''' optimization routine | |||
*Verify drift is low | |||
*Map height profile of sample | |||
*Save data into calibration profile | |||
*Execute pattern writing | |||
=Development= | =Development= | ||