Specific Process Knowledge/Thermal Process/Furnace APOX: Difference between revisions
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==D1 Furnace Apox== | ==D1 Furnace Apox== | ||
[[Image: | [[Image:D1.JPG|thumb|300x300px|D1 Furnace Apox: positioned in cleanroom ?]] | ||
D1 Furnace Apox is a Tempress? horizontal furnace for oxidation silicon wafers. This furnace is dedicated production of apox wafers which is a very thick thermal oxide grown at 1150 <sup>o</sup>C. Running a batch of apox wafers (oxide>5µm) can take several weeks. | D1 Furnace Apox is a Tempress? horizontal furnace for oxidation silicon wafers. This furnace is dedicated production of apox wafers which is a very thick thermal oxide grown at 1150 <sup>o</sup>C. Running a batch of apox wafers (oxide>5µm) can take several weeks. | ||