Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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The molecular formula for hexamethyldisilazane, or bis(trimethylsilyl)amine, is C<sub>6</sub>H<sub>19</sub>NSi<sub>2</sub>. Here is a schematic overview of HMDS treatment of silicon-oxide surface. | The molecular formula for hexamethyldisilazane, or bis(trimethylsilyl)amine, is C<sub>6</sub>H<sub>19</sub>NSi<sub>2</sub>. Here is a schematic overview of HMDS treatment of silicon-oxide surface. | ||
[[File:HMDS priming schematic.png|640px|thumb|right|Schematic of the HMDS vapor priming process]] | |||
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