Specific Process Knowledge/Thin film deposition

Feedback to this page: click here

Unless otherwise stated, this page is written by DTU Nanolab internal

Choose material to deposit

Semiconductors	Oxides	Nitrides	Carbon and Carbides	Metals	Alloys	Transparent conductive oxides	Polymers	Multilayers
Silicon Germanium Diamond	Aluminium Oxide (Al2O3) Barium titanate (BaTiO3) Chromium Oxide (Cr2O3) Hafnium Oxide (HfO2) Magnesium Oxide (MgO) Nickel Oxide (NiO) Silicon Oxide (SiO2) Titanium Oxide (TiO2) Tantalum Oxide (Ta2O5) Vanadium Oxide (VOx) Zinc Oxide (ZnO)	Silicon Nitride - and oxynitride Titanium Nitride - conductive ceramics Aluminum Nitride (AlxNy)	Carbon Titanium Carbide (TiC) Silicon Carbide (SiC)	Aluminium Chromium Cobalt Copper Gold Iron Magnesium Molybdenum Nickel Niobium Palladium Platinum Ruthenium Silver Tantalum Tin Titanium Tungsten Zinc	AlCu CoFe CuTi FeMn MnIr NbTi NiCo NiFe NiV alloy TiW alloy (10%/90% by weight) And an electroceramic: YSZ (Yttrium stabilized zirconia)	ITO (Tin doped Indium Oxide) AZO (Aluminum doped Zinc Oxide)	SU-8 Antistiction coating Topas PMMA	CrSi bilayer

Oh no! My material is not on the list! Please contact the Thin Film group if you would like to inquire about a material that is not mentioned here.

Choose deposition equipment

PVD	LPCVD	PECVD	ALD	Coaters	Others
Sputter-system Metal-Oxide (PC1) and Sputter-system Metal-Nitride (PC3) - Cluster-based multi-chamber high vacuum sputtering deposition system Lesker - Sputter tool Wordentec - E-beam evaporator, sputter and thermal evaporator Thermal evaporator E Beam Evaporator (Temescal) Sputter coater 03 - Gold sputtering system Sputter coater 04 - Gold sputtering system	Furnace LPCVD Nitride (4" and 6") - Deposition of silicon nitride Furnace LPCVD Polysilicon (4" and 6") Deposition of polysilicon Furnace LPCVD TEOS (4") - Deposition of silicon oxide	PECVD - Plasma Enhanced Chemical Vapor deposition Black Magic PECVD - Black Magic PECVD (Carbon) Seki Diamond CVD - Microwave Plasma CVD for diamond Growth	ALD1 - Atomic Layer Deposition (thermal) ALD2 (PEALD) - Atomic Layer Deposition (thermal and plasma enhanced)	See the Lithography/Coaters page for coating polymers	MVD - Molecular Vapor Deposition Electroplating-Ni - Electrochemical deposition of nickel Electroplating-Cu - Electrochemical deposition of copper MOCVD - Epitaxial growth - Ask the department of photonics if you are interested: Elizaveta Semenova or Kresten Yvind