Specific Process Knowledge/Etch/KOH Etch/ProcessInfo: Difference between revisions
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<gallery caption="Anisotropic wet silicon etch: dependency on crystal orientation" widths="380px" heights="150px" perrow="2"> | <gallery caption="Anisotropic wet silicon etch: dependency on crystal orientation" widths="380px" heights="150px" perrow="2"> | ||
Image:KOH- | Image:KOH-Etch.jpg|Etched profile when etching Si(100) and when etching Si(110) respectively | ||
<!-- Image:KOH_Anisotropy.jpg|Etched profile when etching Si(100).--> | <!-- Image:KOH_Anisotropy.jpg|Etched profile when etching Si(100).--> | ||