Specific Process Knowledge/Thermal Process/D4 III-V Oven: Difference between revisions
No edit summary |
|||
| Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/D4_III-V_Oven click here]''' | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/D4_III-V_Oven click here]''' | ||
''This page is written by DTU Nanolab internal'' | |||
===<span style="color:Red">EXPIRED!!! The D4 III-V Oven has been removed from the cleanroom August 2019. The C2 III-V Oxidation furnace is being tested instead.</span>=== | ===<span style="color:Red">EXPIRED!!! The D4 III-V Oven has been removed from the cleanroom August 2019. The C2 III-V Oxidation furnace is being tested instead.</span>=== | ||
| Line 9: | Line 10: | ||
==III-V Oven (D4)== | ==III-V Oven (D4)== | ||
[[Image:IIIV_Oven.jpg|thumb|450x450px|III-V Oven (D4). Positioned in cleanroom area F-3.]] | [[Image:IIIV_Oven.jpg|thumb|450x450px|III-V Oven (D4). Positioned in cleanroom area F-3/ Photo: DTU Nanolab internal.]] | ||
The III-V Oven (D4) is used for wet thermal oxidation of III-V devices, for instance for lateral oxidation of thin AlGaAs layers to defined apertures in light-limiting diodes. | The III-V Oven (D4) is used for wet thermal oxidation of III-V devices, for instance for lateral oxidation of thin AlGaAs layers to defined apertures in light-limiting diodes. | ||