Specific Process Knowledge/Thermal Process/C1 Furnace Anneal-oxide: Difference between revisions
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[[Category: Equipment |Thermal C1]] | [[Category: Equipment |Thermal C1]] | ||
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==Anneal-oxide furnace (C1)== | ==Anneal-oxide furnace (C1)== | ||
[[Image:C1.JPG|thumb|300x300px|Anneal-oxide furnace (C1). Positioned in cleanroom B-1]] | [[Image:C1.JPG|thumb|300x300px|Anneal-oxide furnace (C1). Positioned in cleanroom B-1/ Photo: DTU Nanolab internal]] | ||
The Anneal-oxide furnace (C1) is a Tempress horizontal furnace for oxidation and annealing of silicon wafers. Both 100 mm and 150 mm wafers can be processed in the furnace. | The Anneal-oxide furnace (C1) is a Tempress horizontal furnace for oxidation and annealing of silicon wafers. Both 100 mm and 150 mm wafers can be processed in the furnace. | ||