Specific Process Knowledge/Lithography/SU-8: Difference between revisions

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	'''Puddle development:'''<br>		'''Puddle development:'''<br>
	Puddle development can be done in the Spin coater: gamma ebeam & UV using one of the predefined development sequences. The development is a puddle development, and it requires that the substrate does not have an through holes - if the substrate has		Puddle development can be done in the Spin coater: gamma ebeam & UV using one of the predefined development sequences. The development is a puddle development, and it requires that the substrate does not have an through holes - if the substrate has holes, you need to use immersion development instead.