Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 604: | Line 604: | ||
!Thickness | !Thickness | ||
!Laser | !Laser | ||
!Autofocus | |||
!Exposure mode | !Exposure mode | ||
!Dose | !Dose | ||
| Line 617: | Line 618: | ||
|rowspan="2"| 0.5 µm | |rowspan="2"| 0.5 µm | ||
|rowspan="2"| 375 nm | |rowspan="2"| 375 nm | ||
| Optical | |||
| Fast | | Fast | ||
| 60 mJ/cm<sup>2</sup> | | 60 mJ/cm<sup>2</sup> | ||
| Line 622: | Line 624: | ||
| 1 µm (not optimized) | | 1 µm (not optimized) | ||
| Dev: 2xSP30s | | Dev: 2xSP30s | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Long ago | | Long ago | ||
| Optical | |||
| Quality | | Quality | ||
| 60 mJ/cm<sup>2</sup> | | 60 mJ/cm<sup>2</sup> | ||
| Line 632: | Line 636: | ||
|- | |- | ||
|-style="background: | |-style="background:silver; color:black" | ||
!rowspan="3"| AZ 5214E<br><span style="color:red">Old German version</span> | !rowspan="3"| AZ 5214E<br><span style="color:red">Old German version</span> | ||
| Long ago | | Long ago | ||
|rowspan="3"| 1.5 µm | |rowspan="3"| 1.5 µm | ||
| 405 nm | | 405 nm | ||
| Optical | |||
| Fast | | Fast | ||
| 90 mJ/cm<sup>2</sup> | | 90 mJ/cm<sup>2</sup> | ||
| Line 642: | Line 647: | ||
| 1-2 µm | | 1-2 µm | ||
| Dev: SP60s | | Dev: SP60s | ||
|-style="background: | |||
|-style="background:silver; color:black" | |||
| Long ago | | Long ago | ||
|rowspan="2"| 375 nm | |rowspan="2"| 375 nm | ||
| Optical | |||
| Fast | | Fast | ||
| 65 mJ/cm<sup>2</sup> | | 65 mJ/cm<sup>2</sup> | ||
| Line 650: | Line 657: | ||
| ~1 µm | | ~1 µm | ||
| Dev: SP60s | | Dev: SP60s | ||
|-style="background: | |||
|-style="background:silver; color:black" | |||
| Long ago | | Long ago | ||
| Optical | |||
| Quality | | Quality | ||
| 65 mJ/cm<sup>2</sup> | | 65 mJ/cm<sup>2</sup> | ||
| Line 665: | Line 674: | ||
|rowspan="3"| 1.5 µm | |rowspan="3"| 1.5 µm | ||
| 405 nm | | 405 nm | ||
| Optical | |||
| Fast | | Fast | ||
| 200 mJ/cm<sup>2</sup> | | 200 mJ/cm<sup>2</sup> | ||
| Line 670: | Line 680: | ||
| ~1 µm (not optimized) | | ~1 µm (not optimized) | ||
| PEB: 60s@110°C, Dev: SP60s | | PEB: 60s@110°C, Dev: SP60s | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Long ago | | Long ago | ||
|rowspan="2"| 375 nm | |rowspan="2"| 375 nm | ||
| Optical | |||
| Fast | | Fast | ||
| 170 mJ/cm<sup>2</sup> | | 170 mJ/cm<sup>2</sup> | ||
| Line 678: | Line 690: | ||
| 1 µm | | 1 µm | ||
| PEB: 60s@110°C, Dev: SP60s | | PEB: 60s@110°C, Dev: SP60s | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Long ago | | Long ago | ||
| Optical | |||
| Quality | | Quality | ||
| 180 mJ/cm<sup>2</sup> | | 180 mJ/cm<sup>2</sup> | ||
| Line 688: | Line 702: | ||
|- | |- | ||
|-style="background: | |-style="background:silver; color:black" | ||
!rowspan="2"| AZ nLOF 2020 | !rowspan="2"| AZ nLOF 2020 | ||
| 2021-02-22<br>jehem | | 2021-02-22<br>jehem | ||
|rowspan="2"| 2 µm | |rowspan="2"| 2 µm | ||
|rowspan="2"| 375 nm | |rowspan="2"| 375 nm | ||
| Optical | |||
| Fast | | Fast | ||
| 350 mJ/cm<sup>2</sup> | | 350 mJ/cm<sup>2</sup> | ||
| Line 698: | Line 713: | ||
| 1 µm | | 1 µm | ||
| PEB: 120s@110°C, Dev: SP60s | | PEB: 120s@110°C, Dev: SP60s | ||
|-style="background: | |||
|-style="background:silver; color:black" | |||
| 2021-02-22<br>jehem | | 2021-02-22<br>jehem | ||
| Optical | |||
| Quality | | Quality | ||
| 350 mJ/cm<sup>2</sup> | | 350 mJ/cm<sup>2</sup> | ||
| Line 705: | Line 722: | ||
| 1 µm | | 1 µm | ||
| PEB: 120s@110°C, Dev: SP60s | | PEB: 120s@110°C, Dev: SP60s | ||
|- | |- | ||
| Line 744: | Line 740: | ||
|- | |- | ||
|-style="background: | |-style="background:silver; color:black" | ||
!AZ 5214E image reversal<br><span style="color:green">New Japanese version</span> | !AZ 5214E image reversal<br><span style="color:green">New Japanese version</span> | ||
| 2021-11-25<br>jehem | | 2021-11-25<br>jehem | ||
| Line 772: | Line 768: | ||
|- | |- | ||
|-style="background: | |-style="background:silver; color:black" | ||
!AZ 4562<br><span style="color:green">New Japanese version</span> | !AZ 4562<br><span style="color:green">New Japanese version</span> | ||
| 2021-12-08<br>jehem | | 2021-12-08<br>jehem | ||
| Line 789: | Line 785: | ||
'''Dehydration reducing measures used for testing AZ MiR 701:'''<br> | '''Dehydration reducing measures used for testing AZ MiR 701:'''<br> | ||
The CDA used for the pneumatic autofocus will dehydrate the resist. To reduce this effect, the writehead is parked far away from the write area while setting up the job for at least a few minutes, before starting the exposure. | The CDA used for the pneumatic autofocus will dehydrate the resist. To reduce this effect, the writehead is parked far away from the write area while setting up the job for at least a few minutes, before starting the exposure. | ||
===Aligner: Maskless 03=== | ===Aligner: Maskless 03=== | ||