Specific Process Knowledge/Lithography/Coaters/RCD8: Difference between revisions
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!style="background:silver; color:black;" align="center" width="60"|Purpose | !style="background:silver; color:black;" align="center" width="60"|Purpose | ||
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|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
*Spin coating of SU-8 resists | *Spin coating of SU-8 resists | ||
*Spin coating of PGMEA based AZ resists | *Spin coating of PGMEA based AZ resists | ||
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!style="background:silver; color:black;" align="center" width="60"|Resist | !style="background:silver; color:black;" align="center" width="60"|Resist | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
* manual dispense | * manual dispense | ||
* automatic dispense from syringe | * automatic dispense from syringe | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance | ||
|style="background:LightGrey; color:black"|Coating thickness | |style="background:LightGrey; color:black"|Coating thickness | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
* SU-8 resits: 0.1-200+ µm | * SU-8 resits: 0.1-200+ µm | ||
* AZ 5214E: 1.5-3 µm | * AZ 5214E: 1.5-3 µm | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | ||
|style="background:LightGrey; color:black"|Spin speed | |style="background:LightGrey; color:black"|Spin speed | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Vacuum chuck: 10 - 5000 rpm <br> | Vacuum chuck: 10 - 5000 rpm <br> | ||
Non-vacuum chuck: Max. 3000 rpm | Non-vacuum chuck: Max. 3000 rpm | ||
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|style="background:LightGrey; color:black"|Spin acceleration | |style="background:LightGrey; color:black"|Spin acceleration | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
10 - 3000 rpm/s <br> | 10 - 3000 rpm/s <br> | ||
Max. 1500 rpm/s with Gyrset | Max. 1500 rpm/s with Gyrset | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
* 100 mm wafers | * 100 mm wafers | ||
* 150 mm wafers (vacuum chuck only) | * 150 mm wafers (vacuum chuck only) | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
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All cleanroom materials ? | All cleanroom materials ? | ||
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|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||
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1 | 1 | ||
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