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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,917 edits
Line 95: Line 95:
|Single puddle, 60 s
|Single puddle, 60 s
|rowspan="2"|PEB: 60 s at 110°C
|rowspan="2"|PEB: 60 s at 110°C
Preliminary results
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Long ago
|Long ago
Line 108: Line 106:
|Single puddle, 60 s
|Single puddle, 60 s
|rowspan="1"|PEB: 90 s at 110°C
|rowspan="1"|PEB: 90 s at 110°C
Preliminary results
|-
|-


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