Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 82: | Line 82: | ||
|Long ago | |Long ago | ||
|10 µm | |10 µm | ||
| | |510 mJ/cm<sup>2</sup> | ||
|Multiple puddle, 4 x 60 s | |Multiple puddle, 4 x 60 s | ||
|Multiple exposure with 10-15 s pauses is recommended. | |Multiple exposure with 10-15 s pauses is recommended. | ||
| Line 92: | Line 92: | ||
|Long ago | |Long ago | ||
|1 µm | |1 µm | ||
| | |180 mJ/cm<sup>2</sup> | ||
|Single puddle, 60 s | |Single puddle, 60 s | ||
|rowspan="2"|PEB: 60 s at 110°C | |rowspan="2"|PEB: 60 s at 110°C | ||
| Line 100: | Line 100: | ||
|Long ago | |Long ago | ||
|2 µm | |2 µm | ||
| | |200 mJ/cm<sup>2</sup> | ||
|Single puddle, 60 s | |Single puddle, 60 s | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Long ago | |Long ago | ||
|4 µm | |4 µm | ||
| | |400 mJ/cm<sup>2</sup> | ||
|Single puddle, 60 s | |Single puddle, 60 s | ||
|rowspan="1"|PEB: 90 s at 110°C | |rowspan="1"|PEB: 90 s at 110°C | ||
| Line 117: | Line 117: | ||
|Long ago | |Long ago | ||
|2 µm | |2 µm | ||
| | |110 mJ/cm<sup>2</sup> | ||
|Single puddle, 60 s | |Single puddle, 60 s | ||
|PEB: 60 s at 110°C | |PEB: 60 s at 110°C | ||