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Development of
Development of:
*SU-8
*SU-8
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Development of
Development of:
*CSAR
*ZEP 520A
*Zep520A
*AR-P 6200.xx (CSAR)
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Development of
Development of:
*AZ nLOF
*AZ nLOF
*AZ MiR 701
*AZ MiR 701
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*AZ 4562
*AZ 4562
*DUV resists
*DUV resists
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Development of
Development of:
*AZ nLOF
*AZ nLOF
*AZ MiR 701
*AZ MiR 701
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*DUV resists
*DUV resists
Post-exposure baking
Post-exposure baking
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|style="background:WhiteSmoke; color:black"|
Development of
Development of:
*DUV resists
*DUV resists
Post-exposure baking
Post-exposure baking
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mr-Dev 600
mr-Dev 600 (PGMEA)
 
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(PGMEA)
*ZED N-50
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*AR-600-546
N-50
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AZ 726 MIF (2.38% TMAH in water)
AR600-546
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AZ 726 MIF (2.38% TMAH in water)
AZ 726 MIF
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AZ 726 MIF (2.38% TMAH in water)
(2.38% TMAH in water)
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AZ 726 MIF
 
(2.38% TMAH in water)
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AZ 726 MIF
 
(2.38% TMAH in water)


|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Method
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Method
|style="background:LightGrey; color:black"|Development
|style="background:LightGrey; color:black"|Development
 
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Submersion
Submersion
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|style="background:WhiteSmoke; color:black"|
Spray/Puddle
Spray/Puddle
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|style="background:WhiteSmoke; color:black"|
Spray/Puddle
Spray/Puddle
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|style="background:WhiteSmoke; color:black"|
Puddle
Puddle
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Puddle
Puddle
|-
|-
|style="background:LightGrey; color:black"|Handling
|style="background:LightGrey; color:black"|Handling
 
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|style="background:WhiteSmoke; color:black" align="center"|
Single wafer carrier
Single wafer holder
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*Vacuum chuck for 100 mm & 150 mm substrates
Vacuum chuck for 2",4" and 6" (the same) or chip "basket"
*Chip chuck for chips & 2" substrates
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|style="background:WhiteSmoke; color:black"|
Edge handling chuck for 4" and 6" or chip "basket"
*Vacuum chuck for 100 mm & 150 mm substrates
|style="background:WhiteSmoke; color:black" align="center"|
*Chip chuck for chips & 2" substrates
|style="background:WhiteSmoke; color:black"|
Vacuum chuck
Vacuum chuck
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Vacuum chuck
Vacuum chuck
|-
|-
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|style="background:LightGrey; color:black"|Temperature
|style="background:LightGrey; color:black"|Temperature


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|style="background:WhiteSmoke; color:black"|
Room temperature
Room temperature
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|style="background:WhiteSmoke; color:black"|
Room temperature
Room temperature
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|style="background:WhiteSmoke; color:black"|
Room temperature
Room temperature
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Room temperature
Room temperature
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Room temperature
Room temperature
|-
|-
|style="background:LightGrey; color:black"|Agitation
|style="background:LightGrey; color:black"|Agitation


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|style="background:WhiteSmoke; color:black"|
Magnetic stirrer
Magnetic stirrer
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Rotation
Rotation
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|style="background:WhiteSmoke; color:black"|
Rotation
Rotation
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|style="background:WhiteSmoke; color:black"|
Rotation
Rotation
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Rotation
Rotation
|-
|-
|style="background:LightGrey; color:black"|Rinse
|style="background:LightGrey; color:black"|Rinse


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|style="background:WhiteSmoke; color:black"|
IPA
IPA
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|style="background:WhiteSmoke; color:black"|
IPA
IPA
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|style="background:WhiteSmoke; color:black"|
DI water
DI water
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|style="background:WhiteSmoke; color:black"|
DI water
DI water
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
DI water
DI water


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|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Substrate size


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|style="background:WhiteSmoke; color:black"|
* 100 mm wafers
*100 mm wafers
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
* Chips (5mm to 2")
* Chips (5mm to 2")
* 50 mm wafers
* 50 mm wafers
* 100 mm wafers
* 100 mm wafers
* 150 mm wafers
* 150 mm wafers
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
* Chips (5mm to 2")
* Chips (5mm to 2")
* 100 mm wafers
* 100 mm wafers
* 150 mm wafers
* 150 mm wafers
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
* 100 mm wafers
* 100 mm wafers
* 150 mm wafers
* 150 mm wafers
|style="background:WhiteSmoke; color:black" align="center"|
* 200 mm wafers (may require tool change)
|style="background:WhiteSmoke; color:black"|
* 100 mm wafers
* 100 mm wafers
* 150 mm wafers
* 150 mm wafers
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|style="background:LightGrey; color:black"|Allowed materials
|style="background:LightGrey; color:black"|Allowed materials


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|style="background:WhiteSmoke; color:black"|
Silicon and glass substrates
*Silicon and glass substrates
 
*Film or pattern of all but Type IV
Film or pattern of all but Type IV
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|style="background:WhiteSmoke; color:black" align="center"|
All cleanroom approved materials
All cleanroom approved materials
 
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|style="background:WhiteSmoke; color:black" align="center"|
*All cleanroom approved materials
All cleanroom approved materials  
*Film or pattern of all types
 
|style="background:WhiteSmoke; color:black"|
Film or pattern of all types
*Silicon and glass substrates
|style="background:WhiteSmoke; color:black" align="center"|
*Film or pattern of all but Type IV
Silicon and glass substrates
|style="background:WhiteSmoke; color:black"|
 
*Silicon, III-V, and glass substrates
Film or pattern of all but Type IV
*Film or pattern of all but Type IV
|style="background:WhiteSmoke; color:black" align="center"|
Silicon, III-V, and glass substrates
 
Film or pattern of all but Type IV
|-
|-
|style="background:LightGrey; color:black"|Batch
|style="background:LightGrey; color:black"|Batch


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|style="background:WhiteSmoke; color:black" align="center"|
1-6
1 - 6
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|style="background:WhiteSmoke; color:black" align="center"|
1
1
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1
1
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|style="background:WhiteSmoke; color:black" align="center"|
1-25  
1 - 25  
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|style="background:WhiteSmoke; color:black" align="center"|
1-25
1 - 25
|-  
|-  
|}
|}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Development"