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| {| id="linkTable" border="1" cellpadding="0" cellspacing="0" style="text-align:center;" | | {| id="linkTable" border="1" cellpadding="0" cellspacing="0" style="text-align:center;" |
| ! class="hideImage" style="display:none"| Front Image | | ! class="hideImage" style="display:none"| Front Image |
| ! style="display:none"|-
| |
| ! style="display:none"|- | | ! style="display:none"|- |
| |- | | |- |
| ! class="hideImage" width="150" height="180px"| Clean your sample[[file:jehanClean.png|130px|frameless ]] | | ! class="hideImage" width="150" height="180px"| Clean your sample[[file:jehanClean.png|130px|frameless ]] |
| ! class="hideImage" width="150" | Dry your sample [[file:jehanDry.png|130px|frameless ]] | | ! class="hideImage" width="150" | Dry your sample [[file:jehanDry.png|130px|frameless ]] |
| ! class="hideImage" width="150" | Create a thin film on your sample [[file:jehanfilm.png|130px|frameless ]]
| |
| |- | | |- |
| ! class="hideImage" width="150" height="180px"| Thermal treatment of your sample [[file:jehanThermal.png|130px|frameless ]] | | ! class="hideImage" width="150" height="180px"| Thermal treatment of your sample [[file:jehanThermal.png|130px|frameless ]] |
| ! class="hideImage" width="150" | Make a mask on your sample[[file:jehanmask.png|130px|frameless ]] | | ! class="hideImage" width="150" | Make a mask on your sample[[file:jehanmask.png|130px|frameless ]] |
| ! class="hideImage" width="150" | Transfer pattern to your sample [[file:jehanTransfer.png|130px|frameless ]]
| |
| |- | | |- |
| |} | | |} |
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| |- | | |- |
| |} | | |} |
| {| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2" align="left" width="600px"
| | |
| !colspan="3" style="text-align:left;" | [[image:Create a film on your sample.png|x100px|Create a layer/film on your sample]] Create a layer/film on your sample
| |
| |-
| |
| !Entry page in LabAdviser
| |
| !Techniques
| |
| !Materials
| |
| |-
| |
| |[[Specific Process Knowledge/Thermal Process/Oxidation| Thermal Process/Oxidation]]
| |
| |Thermal oxidation
| |
| |Thermal SiO2
| |
| |-
| |
| |rowspan="8" valign="top"|[[Specific Process Knowledge/Thin film deposition| Thin film deposition]]
| |
| |Sputter deposition
| |
| |Metals: Al, Ti, Cr, Co, Ni, Cu, Mo, Pd, Ag, Sn, Ta, W, Pt, Au, Fe, Mg, Nb, Ru <br>
| |
| Semiconductors: Si, Ge, ZnO <br>
| |
| Oxides: SiO<sub>2</sub>, ITO, TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, MgO, Ta<sub>2</sub>O<sub>5</sub> Cr<sub>2</sub>O<sub>3</sub><br>
| |
| Transparent Conducting Oxides: ITO, AZO<br>
| |
| Alloys: TiW, NiCr, AlTi, NiV, AlCu, CoFe, CuTi, FeMn, MnIr, NiCo, NiFe, YSZ <br>
| |
| |-
| |
| |Thermal evaporation
| |
| |Al, Ge, Ag
| |
| |-
| |
| |E-beam evaporation
| |
| |Metals: Ti, Cr, Al, Ni, Pt, Au, Mo, Nb, Pd, Ag, Cu, W, Ta <br>
| |
| Semiconductors: Si, Ge <br>
| |
| Oxides: SiO<sub>2</sub>, TiO<sub>2</sub> <br>
| |
| Alloys: NiCr, TiAl
| |
| |-
| |
| |LPCVD
| |
| |Si<sub>3</sub>N<sub>4</sub>, SRN, SiO<sub>2</sub>, Si (poly and amorph)
| |
| |-
| |
| |PECVD
| |
| |Si<sub>3</sub>N<sub>4</sub>, SiO<sub>2</sub>, PBSG
| |
| |-
| |
| |MVD
| |
| |FDTS
| |
| |-
| |
| |Electroplating
| |
| |Ni
| |
| |-
| |
| |Epitaxial growth /MOCVD
| |
| |Al, As, Ga, In, P. doping: Si, Zn
| |
| |-
| |
| |rowspan="2" valign="top"| [[Specific Process Knowledge/Lithography/Coaters|Lithography/Coaters]]
| |
| |Spin coating
| |
| |resists, polymers
| |
| |-
| |
| |Spray coating
| |
| |resists, polymers
| |
| |-
| |
| |}
| |
|
| |
|
| {| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2" align="left" width="430px" | | {| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2" align="left" width="430px" |
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| |Imprinting | | |Imprinting |
| |Polymers | | |Polymers |
| |-
| |
| |}
| |
| {| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2" align="left" width="430px"
| |
| !colspan="3" style="text-align:left;" | [[image:Transfer mask pattrn to your sample.png|x100px|Transfer mask pattern to your sample]] Transfer mask pattern to your sample
| |
| |-
| |
| !Entry page in LabAdviser
| |
| !Techniques
| |
| !Materials
| |
| |-
| |
| |rowspan="2" valign="top"|[[Specific Process Knowledge/Etch| Etch]]
| |
| |Wet etch
| |
| |Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs
| |
| |-
| |
| |Dry etch
| |
| |Any material
| |
| |-
| |
| |[[Specific Process Knowledge/Lithography/LiftOff| Lithography/Lift-off]]
| |
| |Lift-off
| |
| |Most materials
| |
| |- | | |- |
| |} | | |} |
