Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4: Difference between revisions
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*[[/SiO2 Etch|SiO2 Etch]] | *[[/SiO2 Etch|SiO2 Etch]] | ||
*[[/SiN Etch|Silicon Nitride Etch]] | *[[/SiN Etch|Silicon Nitride Etch]] | ||
*[[/Slow etch|Slow etch of silicon nitride and silicon oxide]] | |||
'''Hardware changes''' | '''Hardware changes''' | ||