Specific Process Knowledge/Characterization/Stress measurement: Difference between revisions
Appearance
→Types of stress: added another link |
|||
| Line 15: | Line 15: | ||
*Here you can find some information about [[Specific Process Knowledge/Thin film deposition/Lesker/Stress dependence on sputter parameters in the Lesker sputter system|stress in sputtered films]] made at Nanolab. There is also a recommendation for a general reference to read. | *Here you can find some information about [[Specific Process Knowledge/Thin film deposition/Lesker/Stress dependence on sputter parameters in the Lesker sputter system|stress in sputtered films]] made at Nanolab. There is also a recommendation for a general reference to read. | ||
*This page has information about [[Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Stress Wordentec Ni films|evaporated Ni films]]. | *This page has information about [[Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Stress Wordentec Ni films|stress in e-beam evaporated Ni films]]. | ||
<br clear="all" /> | <br clear="all" /> | ||