Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
| Line 91: | Line 91: | ||
|- | |- | ||
|STOxide | |STOxide | ||
|~100 | |[[/deposition rate for STOxide|~100]] | ||
|~1.47 | |~1.47 | ||
|<1 | |<1 | ||