Specific Process Knowledge/Thin film deposition/ALD2 (PEALD): Difference between revisions
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*[[/TiN deposition using ALD2| TiN deposition using '''ALD 2 (PEALD)''']] | *[[/TiN deposition using ALD2| TiN deposition using '''ALD 2 (PEALD)''']] | ||
*[[/Al2O3 deposition using plasma ALD2 at room temperature| Al<sub>2</sub>O<sub>3</sub> deposition using '''ALD 2 (PEALD)''' at room temperature]] | |||
==Equipment performance and process related parameters== | ==Equipment performance and process related parameters== | ||