Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4: Difference between revisions

Revision as of 11:49, 1 August 2022

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Pegasus 4 - 150mm silicon oxide and silicon nitride etching

The tool is already installed and ready to process. You still have to make manual alignment in the cassette.

The DRIE-Pegasus3 and DRIE-Pegasus4 operator station and cassette loading stations

The user manual(s), quality control procedure(s) and results, user APV(s) are not available, technical information and contact information can be found in LabManager:

Equipment info in LabManager

Process information

Standard recipes

Hardware changes

A few hardware modifications have been made on the Pegasus 3/4 since it was installed in 2019. The changes are listed below.

Change of showerhead in 2019

Wafer bonding

To find information on how to bond wafers or chips to a carrier wafer, click here.

Internal Nanolab Process log for Pegasus 4

Process log at Nanolab [1]

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	[[Image:~~Twinx~~.~~jpg~~ \|frame~~\|left~~\|x300px\|The ~~twin Pegasi (3~~ and ~~4) have just been rolled into the lab on July 3rd 2018.~~ ]]		[[Image:Peg3and4 front 2.JPG \|frame\|x300px\|The DRIE-Pegasus3 and DRIE-Pegasus4 operator station and cassette loading stations]]