Specific Process Knowledge/Thermal Process/E1 Furnace Oxidation (8"): Difference between revisions
| Line 75: | Line 75: | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*New silicon wafers | *New silicon wafers | ||
*Wafers from A-stack furnace | |||
*Wafers from C1 furnace | |||
*Silicon wafers with layers of silicon oxide or silicon nitride (RCA cleaned) | *Silicon wafers with layers of silicon oxide or silicon nitride (RCA cleaned) | ||
*Wafers from the LPCVD furnaces | *Wafers from the LPCVD furnaces | ||