Specific Process Knowledge/Characterization/Profiler: Difference between revisions
| Line 158: | Line 158: | ||
|style="background:LightGrey; color:black"|Max scan depth as a function of trench width W | |style="background:LightGrey; color:black"|Max scan depth as a function of trench width W | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
0. | 0.87*(W[µm]-2µm) = tan(60<sup>o</sup>)/2*(W[µm]-2µm) | ||
(empirically validated by Nanolab staff) | |||
|- | |- | ||
!style="background:silver; color:black" align="left"|Hardware settings | !style="background:silver; color:black" align="left"|Hardware settings | ||