Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions
| Line 50: | Line 50: | ||
|style="background:LightGrey; color:black"|Deposition rate | |style="background:LightGrey; color:black"|Deposition rate | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*0.5-2 Å/s (Al), 5 Å/s (Ag) | *0.5-2 Å/s (Al), 5 Å/s (Ag), 1 Å/s (Cr) | ||
*In general, 0.5-10 Å/s is possible | *In general, 0.5-10 Å/s is possible | ||
*We need to develop a new process for each rate | *We need to develop a new process for each rate | ||