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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,579 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,579 edits
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Click [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/OldConfig | '''here''']] to access older configurations.
Click [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/OldConfig | '''here''']] to access older configurations.


The current configuration is set up for nanoscale etching.
The current configuration is set up for nanoscale etching using the CORE recipe.


{{Template:Peg2configheader1
{{Template:Peg2configheader1
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-2"