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Whereas most dry etch tools are intended to serve as stable platforms with limited or no changes in hardware, Pegasus 2 will be subject to experiments. For instance, as of the end of 2020 the instrument has been set up to run [http://labadviser.nanolab.dtu.dk/images/d/d6/CORE1.pdf '''the CORE process''']. This means that comparing to [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-1|DRIE-Pegasus 1]] and
Whereas most dry etch tools are intended to serve as stable platforms with limited or no changes in hardware, Pegasus 2 will be subject to experiments. For instance, as of the end of 2020 the instrument has been set up to run [http://labadviser.nanolab.dtu.dk/images/d/d6/CORE1.pdf '''the CORE process''']. This means that comparing to [[Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-1|DRIE-Pegasus 1]] and
[[Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-3|DRIE-Pegasus 3]], Pegasus 2 and its allowed usage have been modified (this list is not complete - see the complete list in the table below):
[[Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-3|DRIE-Pegasus 3]], Pegasus 2 and its allowed usage have been modified (this list is not complete - see the complete list in the table below):
# The C<sub>4<\sub>F<sub>8<\sub> MFC has been disconnected to maintain a carbon-free (carbon containing masks are allowed) chamber.
# The C<sub>4</sub>F<sub>8</sub> MFC has been disconnected to maintain a carbon-free (carbon containing masks are allowed) chamber.
# The RF generator supplying the power to the coil has been disconnected thus allowing only processes driven by the platen generator.  
# The RF generator supplying the power to the coil has been disconnected thus allowing only processes driven by the platen generator.  
This kind of experiment will not be allowed on other dry etch tools. Therefore, you should always make sure that whatever process you may want to run on Pegasus 2 is allowed or even possible. The table below should provide this information.
This kind of experiment will not be allowed on other dry etch tools. Therefore, you should always make sure that whatever process you may want to run on Pegasus 2 is allowed or even possible. The table below should provide this information.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-2"