Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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[[Category: Etch (Dry) Equipment|DRIE]] | [[Category: Etch (Dry) Equipment|DRIE]] | ||
=== | ===Restrictions on a dedicated research tool === | ||
In general, the dry etch tools at DTU Nanolab are free to use for users with proper training. The users have freedom to etch the approved materials within rules specified in manuals, LabAdviser and cross contamination sheets. The instruments are set up to meet the broadest range of etch demands. With most of them, there is a continuous tug of war between providing flexibility (for instance allowing mask materials that do not form any volatile etch products with the gas chemistry available in the process chamber) while ensuring process chamber cleanliness. | |||
Pegasus 2 is a dedicated research tool. As such, it will not be released for general use | |||
If you want to get access to the tool, then talk to professor Henry Jansen | If you want to get access to the tool, then talk to professor Henry Jansen | ||
* [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Nanoscale silicon etching with SF6 and O2|Nanoscale silicon etching with SF6 and O2 ]] | * [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Nanoscale silicon etching with SF6 and O2|Nanoscale silicon etching with SF6 and O2 ]] | ||
* [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Black silicon on Demand|Black silicon on Demand]] | * [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Black silicon on Demand|Black silicon on Demand]] | ||
== Current setup and rules on Pegasus 2 == | == Current setup and rules on Pegasus 2 == | ||