Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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{{Template:Peg2configcontent1
{{Template:Peg2configcontent1
|ItemName=  
|ItemName= Available gasses and gas chemistry
{| | A | B|- | C| D|}Available gasses and gas chemistry
|ItemConfiguration=  
|ItemConfiguration=  
* SF6: 50 sccm
* SF6: 50 sccm

Revision as of 10:21, 14 December 2020

Feedback to this page: click here

This system is a research tool and not available to the users

If you want to get access to the tool, then talk to professor Henry Jansen


Current setup and rules on Pegasus 2

Click here to access older configurations.

The current configuration is

{{Template:Peg2configcontent1
Currently valid from November 2020 onwards
Item The currently applied modification Comments
ItemName= Available gasses and gas chemistry ItemConfiguration=
  • SF6: 50 sccm
  • O2: 50 sccm
  • Ar: 283 sccm
  • N2: 500 sccm
  • He: 11 sccm
  • CO2: (It is not in the software)
 ItemComment=OnlySF6 and O2 are used for Si, PR, and Cr etch. The rest is only make-up

Access to Pegasus 2 configuration templates

Pegasus 2 configuration table version 1

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