Specific Process Knowledge/Thin film deposition: Difference between revisions
m →Choose material to deposit: new link for BaTiO3 |
m →Choose material to deposit: added oxides |
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[[/Sputter deposition of oxides and other compounds|Chromium Oxide (Cr<sub>2</sub>O<sub>3</sub>)]]<br/> | [[/Sputter deposition of oxides and other compounds|Chromium Oxide (Cr<sub>2</sub>O<sub>3</sub>)]]<br/> | ||
[[/Deposition of Hafnium Oxide|Hafnium Oxide (HfO<sub>2</sub>)]]<br/> | [[/Deposition of Hafnium Oxide|Hafnium Oxide (HfO<sub>2</sub>)]]<br/> | ||
[[/Sputter deposition of oxides and other compounds|Magnesium Oxide (MgO)]]<br/> | |||
[[/Sputter deposition of oxides and other compounds|Nickel Oxide (NiO)]]<br/> | |||
[[/Deposition of Silicon Oxide|Silicon Oxide (SiO<sub>2</sub>)]]<br/> | [[/Deposition of Silicon Oxide|Silicon Oxide (SiO<sub>2</sub>)]]<br/> | ||
[[/Deposition of Titanium Oxide|Titanium Oxide (TiO<sub>2</sub>)]]<br/> | [[/Deposition of Titanium Oxide|Titanium Oxide (TiO<sub>2</sub>)]]<br/> | ||
[[/Sputter deposition of oxides and other compounds|Tantalum Oxide (Ta<sub>2</sub>O<sub>5</sub>)]]<br/> | [[/Sputter deposition of oxides and other compounds|Tantalum Oxide (Ta<sub>2</sub>O<sub>5</sub>)]]<br/> | ||
[[/Sputter deposition of oxides and other compounds|Vanadium Oxide (VO<sub>x</sub>)]]<br/> | |||
[[/Deposition of ZnO|Zinc Oxide (ZnO)]]<br/> | [[/Deposition of ZnO|Zinc Oxide (ZnO)]]<br/> | ||