Specific Process Knowledge/Thin film deposition: Difference between revisions

Sputter-system Metal-Oxide (PC1) and Sputter-system Metal-Nitride (PC3) - Cluster-based multi-chamber high vacuum sputtering deposition system
Lesker - Sputter tool
Wordentec - E-beam evaporator, sputter and thermal evaporator
Thermal evaporator
E Beam Evaporator (Temescal)
Physimeca - E-beam evaporator
IBE/IBSD Ionfab 300 - Sputter deposition of high quality optical layers and milling/etching
Sputter coater 03 - Gold sputtering system
Sputter coater 04 - Gold sputtering system

See the Lithography/Coaters page for coating polymers

MVD - Molecular Vapor Deposition
Electroplating-Ni - Electrochemical deposition of nickel
Electroplating-Cu - Electrochemical deposition of copper
MOCVD - Epitaxial growth - Ask the department of photonics if you are interested: Elizaveta Semenova or Kresten Yvind

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 [[/Sputter deposition of oxides and other compounds|Chromium Oxide (Cr<sub>2</sub>O<sub>3</sub>)]]<br/>
 [[/Deposition of Hafnium Oxide|Hafnium Oxide (HfO<sub>2</sub>)]]<br/>
+[[/Sputter deposition of oxides and other compounds|Magnesium Oxide (MgO)]]<br/>
+[[/Sputter deposition of oxides and other compounds|Nickel Oxide (NiO)]]<br/>
 [[/Deposition of Silicon Oxide|Silicon Oxide (SiO<sub>2</sub>)]]<br/>
 [[/Deposition of Titanium Oxide|Titanium Oxide (TiO<sub>2</sub>)]]<br/>
 [[/Sputter deposition of oxides and other compounds|Tantalum Oxide (Ta<sub>2</sub>O<sub>5</sub>)]]<br/>
+[[/Sputter deposition of oxides and other compounds|Vanadium Oxide (VO<sub>x</sub>)]]<br/>
 [[/Deposition of ZnO|Zinc Oxide (ZnO)]]<br/>