Specific Process Knowledge/Characterization/XRD/XRD SmartLab: Difference between revisions
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==Software for analysis== | ==Software for analysis== | ||
Please see the Data Analysis section at the main [[Specific Process Knowledge/Characterization/XRD|XRD page]]. | Please see the Data Analysis section at the main [[Specific Process Knowledge/Characterization/XRD|XRD page]]. | ||
==Characterization of thin films using X-ray reflectivity (XRR)== | |||
Implementing the XRR method the user can calculate thickness, density, and roughness of the deposited material. The XRR is also widely employed for multilayer stack analysis. | |||
Here are some results available: | |||
* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Aluminium/Al_Ebeam_evaporation_in_Temescal|e-beam deposited Al thin films]]. | |||
* Characterization of [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab/ALD_deposited_alumina_and_titania_XRR_and_SE_comparison|ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers]]. | |||
==Equipment performance and process related parameters== | ==Equipment performance and process related parameters== | ||
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