Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy/AFM Icon Acceptance: Difference between revisions

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==AFM Icon-Pt 2: Acceptance test==
==AFM Icon-Pt 2: Acceptance test==
===Noise tests===
====Sensor noise====
Tappingmode, OTESPA-R3 probe used. <br>
First we made a false engage (scanning in air):
Turn off gain 0 0 <br>
Z range 0.2my <br>
Scan size 0.01nm <br>
We saw some 50Hz noise (electrical - or maybe pumps): Rq 15 pm (specs 35pm) <br>
[[File:SensorNoise.jpg|thumb|left|400px]] <br clear="all" />
====System noise====
Noise on sample: scan size 0.1nm <br>
we started with 1my scan size to optimize the scan. <br>
2.43Hz <br>
256 lines <br>
Z range at 2my to get sub nanometer resolution in Z <br>
Rq: 54,5pm (plade vibrator koerte udenfor)  <br>
Rq: 23pm uden vibrator koerende + ro og med aaben hood. <br>
Rq:71pm uden vibrator koerende + ro og med lukket hood <br>
[[File:SystemNoise.jpg|thumb|left|400px]][[File:systemNoise_open_closed_hood.jpg|thumb|left|400px]]
<br clear="all" />

Revision as of 11:39, 18 May 2020

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Accessories following the systems

Equipment AFM Icon AFM Icon 2
Chucks
  • A symmetric chuck that handles up to 210mm wafers and 15mm thick
  • An asymmetric chuck that handles up to ~4" wafer (but not small pieces) - using this a whole 4" can be accessed without rotating the sample.
  • A symmetric chuck that handles up to 210mm wafers and 15mm thick
Holders
  • Magnetic sample holder + magnetic discs + double sided tape
  • Holder for vertical profile scans
  • Magnetic sample holder + magnetic discs + double sided tape
  • Holder for vertical profile scans ?
Modes included
  • PeakForce Tapping mode / ScanAsyst
  • TappingMode (air)
  • Contact Mode
  • Lateral Force Microscopy
  • Phase Imaging
  • Lift mode
  • MFM
  • Force Spectroscopy
  • Force volume
  • EFM
  • surface potential
  • Torsional Resonance Mode
  • Piezoresponse Microscopy
  • Force spectroscopy


Extra modes:

  • PeakForce KPFM package (incl extra box for high voltage PF KPFM)
  • PFQNM package
  • Microscope Image Registration and Overlay (MIRO) software. this is only working in the old software (before version 9.4)
  • PeakForce Tapping mode / ScanAsyst
  • TappingMode (air)
  • Contact Mode
  • Lateral Force Microscopy
  • Phase Imaging
  • Lift mode
  • Force Spectroscopy
  • Force volume
  • surface potential
  • Torsional Resonance Mode
  • Piezoresponse Microscopy
  • Force spectroscopy


Probes that followed the systems
ScanAsyst mode Tapping mode Contact mode PF-KPFM
  • ScanAsyst air 30ps
  • ScanAsyst fluid 10ps
  • ScanAsyst fluid + 10ps
  • MPP-11100-10
  • MPP-21100-10
  • MPP-11120-10 RTESPA
  • TESPA-V2 10ps
  • OTESPA-R3 10ps
  • High Aspect ratio probes 1:15: FIB6-400A 5ps
  • MPP-12120 10ps. Tap150A
  • MPP-13120-10 TAP525A
  • SNL-10 20ps
  • SCM-PIT 10ps
  • PFQNE-Al 10ps
ScanAsyst mode Tapping mode Contact mode
  • ScanAsyst air 20ps
  • ScanAsyst fluid 10ps
  • ScanAsyst fluid + 10ps
  • RTESP-300 (like MPP-11100-10)
  • RFESP-75 (like MPP-21100-10)
  • TESPA-V2 10ps
  • OTESPA-R3 10ps
  • NCHV 10ps
  • SNL-10 20ps
Samples
  • QC grid: VGRP-15M 10µm pitch and depth reference 178nm
  • PF KPFM-SMPL Kelvin probe Sample: Al + Au on Si
  • HOPG: Highly Oriented Pyrolytic Graphite

Calibration samples for getting quantitative modulus measurements:

  1. PDMS-soft-1-12M: PDMS gel 2.5MPa
  2. PDMS-soft-2-12M: PDMS gel 3.5MPa
  3. PSFilm-12M: Polystyrene filem
  4. FSilica-12M: Fused Silica
  5. Sapphire-12M: Sapphire
  6. RS-12M: Ti roughness sample
  7. HOPG-12M: Highly Orientated Pyrolytic Graphite
  8. PS-LDPE: Harmonix training
  • QC grid: VGRP-15M 10µm pitch and depth reference 181nm
  • HOPG: Highly Oriented Pyrolytic Graphite


AFM Icon-Pt 1: Acceptance tests done

Noise tests

Sensor noise

Tappingmode, OTESPA-R3 probe used.
First we made a false engage (scanning in air): Turn off gain 0 0
Z range 0.2my
Scan size 0.01nm
We saw some 50Hz noise (electrical - or maybe pumps): Rq 15 pm (specs 35pm)


System noise

Noise on sample: scan size 0.1nm
we started with 1my scan size to optimize the scan.
2.43Hz
256 lines
Z range at 2my to get sub nanometer resolution in Z
Rq: 54,5pm (plade vibrator koerte udenfor)
Rq: 23pm uden vibrator koerende + ro og med aaben hood.
Rq:71pm uden vibrator koerende + ro og med lukket hood


Roughness

HAR: 200nm wide 400nm deep

HAR: 2µm wide 6µm deep

Graphene KPFM measurement


Height image: The graphene and structuring in graphene is not visible
Potential image: Potential difference between grapheme and non-graphene is visible
Phase: Phase imaging maps the phase lag between the periodic signal driving the cantilever and the oscillations of the cantilever. Changes in phase lag often indicate changes in the properties of the sample surface. Here the structuring in the graphene is very clear

AFM Icon-Pt 2: Acceptance test

Noise tests

Sensor noise

Tappingmode, OTESPA-R3 probe used.
First we made a false engage (scanning in air): Turn off gain 0 0
Z range 0.2my
Scan size 0.01nm
We saw some 50Hz noise (electrical - or maybe pumps): Rq 15 pm (specs 35pm)


System noise

Noise on sample: scan size 0.1nm
we started with 1my scan size to optimize the scan.
2.43Hz
256 lines
Z range at 2my to get sub nanometer resolution in Z
Rq: 54,5pm (plade vibrator koerte udenfor)
Rq: 23pm uden vibrator koerende + ro og med aaben hood.
Rq:71pm uden vibrator koerende + ro og med lukket hood


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