Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
| Line 8: | Line 8: | ||
*[[/Si Nano Etch|Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]] | *[[/Si Nano Etch| Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]] | ||
*[[/Black silicon on Demand]] | *[[/Si Nano Etch| Black silicon on Demand]] | ||
Revision as of 11:06, 11 May 2020
Feedback to this page: click here
This system is a research tool and not available to the users
If you want to get access to the tool, then take to professor Henry Jansen