Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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*[[/Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]] | *[[/Si Nano Etch|Nanoscale silicon etching with SF<sub>6</sub> and O<sub>2</sub>]] | ||
*[[/Black silicon on Demand]] | *[[/Black silicon on Demand]] |
Revision as of 11:05, 11 May 2020
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This system is a research tool and not available to the users
If you want to get access to the tool, then take to professor Henry Jansen