Specific Process Knowledge/Thin film deposition: Difference between revisions
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| align="left" valign="top" style="background:LightGray"|''' Semiconductors''' | | align="left" valign="top" style="background:LightGray"|''' Semiconductors''' | ||
| align="left" valign="top" style="background:#DCDCDC;"|''' Oxides''' | | align="left" valign="top" style="background:#DCDCDC;"|''' Oxides''' | ||
| align="left" valign="top" style="background:LightGray"|''' | | align="left" valign="top" style="background:LightGray"|''' Nitrides''' | ||
| align="left" valign="top" style="background:#DCDCDC;"|''' | | align="left" valign="top" style="background:#DCDCDC;"|''' Metals''' | ||
| align="left" valign="top" style="background:LightGray"|''' Alloys''' | | align="left" valign="top" style="background:LightGray"|''' Alloys''' | ||
| align="left" valign="top" style="background:#DCDCDC;"|''' Transparent conductive oxides''' | | align="left" valign="top" style="background:#DCDCDC;"|''' Transparent conductive oxides''' | ||
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[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/> | |||
[[/Deposition of Titanium Nitride|Titanium Nitride]] - ''conductive ceramics'' <br/> | |||
[[/Deposition of Aluminium Nitride| Aluminum Nitride (Al<sub>x</sub>N<sub>y</sub>)]]<br/> | |||
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[[/Deposition of Aluminium|Aluminium]] <br/> | [[/Deposition of Aluminium|Aluminium]] <br/> | ||
[[/Deposition of Chromium|Chromium]]<br/> | [[/Deposition of Chromium|Chromium]]<br/> | ||
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Revision as of 08:42, 11 May 2020
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Choose material to deposit
Semiconductors | Oxides | Nitrides | Metals | Alloys | Transparent conductive oxides | Polymers |
Aluminium Oxide (Al2O3)
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Silicon Nitride - and oxynitride
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Aluminium
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AlCu And an electroceramic: YSZ (Yttrium stabilized zirconia) |
ITO (Tin doped Indium Oxide) |
SU-8 |
Choose deposition equipment
PVD | LPCVD | PECVD | ALD | Coaters | Others
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See the Lithography/Coaters page for coating polymers |
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