Specific Process Knowledge/Thin film deposition: Difference between revisions

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| align="left" valign="top"  style="background:LightGray"|''' Semiconductors'''
| align="left" valign="top"  style="background:LightGray"|''' Semiconductors'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Oxides'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Oxides'''
| align="left" valign="top" style="background:LightGray"|''' Metals'''
| align="left" valign="top" style="background:LightGray"|''' Nitrides'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Nitrides'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Metals'''
| align="left" valign="top" style="background:LightGray"|''' Alloys'''
| align="left" valign="top" style="background:LightGray"|''' Alloys'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Transparent conductive oxides'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Transparent conductive oxides'''
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[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/>
[[/Deposition of Titanium Nitride|Titanium Nitride]] - ''conductive ceramics'' <br/>
[[/Deposition of Aluminium Nitride| Aluminum Nitride (Al<sub>x</sub>N<sub>y</sub>)]]<br/>




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|style="background: #DCDCDC"|
[[/Deposition of Aluminium|Aluminium]] <br/>
[[/Deposition of Aluminium|Aluminium]] <br/>
[[/Deposition of Chromium|Chromium]]<br/>
[[/Deposition of Chromium|Chromium]]<br/>
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|style="background: #DCDCDC"|
[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/>
[[/Deposition of Titanium Nitride|Titanium Nitride]] - ''conductive ceramics'' <br/>
[[/Deposition of Aluminium Nitride| Aluminum Nitride (Al<sub>x</sub>N<sub>y</sub>)]]<br/>


|style="background: LightGray"|
|style="background: LightGray"|

Revision as of 08:42, 11 May 2020

3rd Level - Material/Method

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Choose material to deposit

Semiconductors Oxides Nitrides Metals Alloys Transparent conductive oxides Polymers

Silicon
Germanium

Aluminium Oxide (Al2O3)
Barium titanate (BaTiO3)
Chromium Oxide (Cr2O3)
Hafnium Oxide (HfO2)
Silicon Oxide (SiO2)
Titanium Oxide (TiO2)
Tantalum Oxide (Ta2O5)
Zinc Oxide (ZnO)


Silicon Nitride - and oxynitride
Titanium Nitride - conductive ceramics
Aluminum Nitride (AlxNy)


Aluminium
Chromium
Cobalt
Copper
Gold
Iron
Magnesium
Molybdenum
Nickel
Niobium
Palladium
Platinum
Ruthenium
Silver
Tantalum
Tin
Titanium
Tungsten
Zinc


AlCu
CoFe
CuTi
FeMn
MnIr
NbTi
NiCo
NiFe
NiV alloy
TiW alloy (10%/90% by weight)

And an electroceramic:

YSZ (Yttrium stabilized zirconia)

ITO (Tin doped Indium Oxide)
AZO (Aluminum doped Zinc Oxide)

SU-8
Antistiction coating
Topas
PMMA

Choose deposition equipment

PVD LPCVD PECVD ALD Coaters Others



  • ALD1 - Atomic Layer Deposition (thermal)
  • ALD2 (PEALD) - Atomic Layer Deposition (thermal and plasma enhanced)

See the Lithography/Coaters page for coating polymers