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| align="left" valign="top" style="background:#DCDCDC;"|''' Semicondutors'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Semicondutors'''
| align="left" valign="top" style="background:LightGray"|''' Metals'''
| align="left" valign="top" style="background:LightGray"|''' Metals'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Alloys'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Nitrides'''
| align="left" valign="top" style="background:LightGray"|''' Transparent conductive oxides'''
| align="left" valign="top" style="background:LightGray"|''' Alloys'''
| align="left" valign="top" style="background:#DCDCDC"|''' Polymers'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Transparent conductive oxides'''
| align="left" valign="top" style="background:LightGray"|''' Polymers'''
|-valign="top"
|-valign="top"
|style="background: LightGray"|
|style="background: LightGray"|
[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/>
[[/Deposition of Silicon Oxide|Silicon Oxide]]<br/>
[[/Deposition of Silicon Oxide|Silicon Oxide]]<br/>
[[/Deposition of Titanium Oxide|Titania (TiO<sub>2</sub>, Titanium Oxide)]]<br/>
[[/Deposition of Titanium Oxide|Titania (TiO<sub>2</sub>, Titanium Oxide)]]<br/>
[[/Deposition of Alumina|Alumina (Al<sub>2</sub>O<sub>3</sub>, Aluminium Oxide)]]<br/>
[[/Deposition of Alumina|Alumina (Al<sub>2</sub>O<sub>3</sub>, Aluminium Oxide)]]<br/>
[[/Deposition of Aluminium Nitride| Aluminum Nitride (Al<sub>x</sub>N<sub>y</sub>)]]<br/>
[[/Lesker|Tantalum (Ta<sub>2</sub>O<sub>5</sub>, Tantalum pentoxide)]]<br/>
[[/Lesker|Tantalum (Ta<sub>2</sub>O<sub>5</sub>, Tantalum pentoxide)]]<br/>
[[/Lesker|Chromia (Cr<sub>2</sub>O<sub>3</sub>, Chromium Oxide)]]<br/>
[[/Lesker|Chromia (Cr<sub>2</sub>O<sub>3</sub>, Chromium Oxide)]]<br/>
[[/Deposition of Hafnium Oxide|Hafnium Oxide]]<br/>
[[/Deposition of Hafnium Oxide|Hafnium Oxide]]<br/>
[[/Deposition of Titanium Nitride|Titanium Nitride]] - ''ceramic'' <br/>
 
|style="background: #DCDCDC"|
|style="background: #DCDCDC"|
[[/Deposition of Silicon|Silicon]] <br/>
[[/Deposition of Silicon|Silicon]] <br/>
[[/Deposition of Germanium|Germanium]] <br/>
[[/Deposition of Germanium|Germanium]] <br/>
[[/Deposition of ZnO|Zinc Oxide (ZnO)]]<br/>
[[/Deposition of ZnO|Zinc Oxide (ZnO)]]<br/>
|style="background: LightGray"|
|style="background: LightGray"|
[[/Deposition of Aluminium|Aluminium]] <br/>
[[/Deposition of Aluminium|Aluminium]] <br/>
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[[/Deposition of Tungsten|Tungsten]]<br/>
[[/Deposition of Tungsten|Tungsten]]<br/>
[[/Deposition of Zinc|Zinc]]<br/>
[[/Deposition of Zinc|Zinc]]<br/>
|style="background: #DCDCDC"|
|style="background: #DCDCDC"|
[[/Deposition of Silicon Nitride|Silicon Nitride]] - ''and oxynitride'' <br/>
[[/Deposition of Titanium Nitride|Titanium Nitride]] - ''ceramic'' <br/>
[[/Deposition of Aluminium Nitride| Aluminum Nitride (Al<sub>x</sub>N<sub>y</sub>)]]<br/>
|style="background: LightGray"|
[[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/>
[[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/>
[[/Deposition of NiV|NiV]] alloy <br/>
[[/Deposition of NiV|NiV]] alloy <br/>
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[[/Deposition of NiFe|NiFe]]<br/>
[[/Deposition of NiFe|NiFe]]<br/>
[[/Lesker|YSZ (Yttrium stabilized Zirconium)]]<br/>
[[/Lesker|YSZ (Yttrium stabilized Zirconium)]]<br/>
|style="background: LightGray"|
 
|style="background: #DCDCDC"|
[[/Lesker|ITO (Tin doped Indium Oxide)]]<br/>
[[/Lesker|ITO (Tin doped Indium Oxide)]]<br/>
[[/Deposition of AZO |AZO (Aluminum doped Zinc Oxide)]]<br/>
[[/Deposition of AZO |AZO (Aluminum doped Zinc Oxide)]]<br/>
|style="background: #DCDCDC"|
 
|style="background: LightGray"|
[[Specific Process Knowledge/Lithography/SU-8|SU-8]]<br/>
[[Specific Process Knowledge/Lithography/SU-8|SU-8]]<br/>
[[Specific Process Knowledge/Thin film deposition/MVD#Processing on the MVD| Antistiction coating]] <br/>
[[Specific Process Knowledge/Thin film deposition/MVD#Processing on the MVD| Antistiction coating]] <br/>
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