Specific Process Knowledge/Characterization/XRD: Difference between revisions
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==Data analysis== | ==Data analysis== | ||
For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis. If more advanced powder analysis is needed a remote desktop with a licens for the Malvern Panalytical software, HighScore is available. | For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis. | ||
If more advanced powder analysis is needed a remote desktop with a licens for the Malvern Panalytical software, HighScore is available. | |||
[[/software|Installing SmartLab Studio II]] | [[/software|Installing SmartLab Studio II]] |
Revision as of 13:27, 3 April 2020
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XRD at Nanolab
We have two X-ray diffraction setups in building 346:
- The Rigaku SmartLab primarily for thin film analysis
- The XRD Powder for phase analysis of powders
Data analysis
For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis. If more advanced powder analysis is needed a remote desktop with a licens for the Malvern Panalytical software, HighScore is available.
Comparison of the XRDs at Nanolab
Equipment | XRD SmartLab | XRD Powder | |
---|---|---|---|
Purpose | Crystal structure analysis and thin film thickness measurement |
|
|
X-ray generator |
Maximum rated output |
3 kW |
600 W |
Rated tube voltage |
20 to 45 kV |
40 kV | |
Rated tube current |
2 to 60 mA |
15 mA | |
Type |
Sealed tube |
Sealed tube | |
Target |
Cu |
Cu | |
Focus size |
0.4 mm x 8 mm (Line/Point) |
0.4 mm x 12 mm (Line) | |
Goniometer |
Scanning mode |
incident / receiver coupled or independent |
incident / receiver coupled |
Goniomenter radius |
300 mm |
145 mm | |
Minimum step size |
0.0001° (0.36") |
0.001° (3.6") | |
Sample stage |
|
Fixed with rotation | |
Sample size |
Diameter: 150 mm Thickness: 0~21 mm |
Powders | |
Optics | Incident side |
|
|
Receiver side |
|
| |
Substrates | Measurement temperature |
Room temperature |
May be heated in N2 up to 500°C |
Substrate size |
up to 150 mm wafers |
Only for powders | |
Allowed materials |
All materials |
All materials have to be approved |