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Specific Process Knowledge/Lithography/Development: Difference between revisions

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Lgpe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701
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Lgpe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701
353 edits
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*AR 600 - 546 (developer X AR 600-54/6) used for CSAR 6200 series
*AR 600 - 546 (developer X AR 600-54/6) used for CSAR 6200 series
*ZED N-50 used for Zep520A resists
*ZED N-50 used for Zep520A resists
*IPA for rinsing


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