Specific Process Knowledge/Lithography/Development: Difference between revisions
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*AR 600-546 ( | *AR 600 - 546 (developer X AR 600-54/6) used for CSAR 6200 series | ||
*N-50 | *ZED N-50 used for Zep520A resists | ||
*IPA for rinsing | *IPA for rinsing | ||