Specific Process Knowledge/Lithography/Development: Difference between revisions
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*546 10s: 10s. Development Rinse and dry. | *546 10s: 10s. Development Rinse and dry. | ||
*546 30s: 60s. Development Rinse and dry. | *546 30s: 60s. Development Rinse and dry. | ||
*546 60s: | *546 60s: 60s. Development Rinse and dry. | ||
*546 180s: 180s. Development Rinse and dry. | |||
*N50 10s: 10s. Development Rinse and dry. | *N50 10s: 10s. Development Rinse and dry. | ||
*N50 30s: 30s. Development Rinse and dry. | *N50 30s: 30s. Development Rinse and dry. | ||
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*N50 120s: 120s. Development Rinse and dry. | *N50 120s: 120s. Development Rinse and dry. | ||
*N50 180s: 180s. Development Rinse and dry. | *N50 180s: 180s. Development Rinse and dry. | ||
*N50 300s: 300s. Development Rinse and dry. | |||
*N50 180s6": Test for changing the agitation for 6" uniformity 180s. Development Rinse and dry. | *N50 180s6": Test for changing the agitation for 6" uniformity 180s. Development Rinse and dry. | ||
*Testdev: The time can be modified 60s. Development Rinse and dry on AR 600-546. | *Testdev: The time can be modified 60s. Development Rinse and dry on AR 600-546. | ||