Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
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It is possible to make perfect capacitors with oxide thicknesses down to and including 5 nm and possibly even thinner, although the failure rate increases. Bear in mind, though that each structure measured here has an area of 8 mm<sup>2</sup> - for a 1 mm<sup>2</sup> structure the failure rate would be much lower, assuming the short circuits are not located on the sides of the structures. | It is possible to make perfect capacitors with oxide thicknesses down to and including 5 nm and possibly even thinner, although the failure rate increases. Bear in mind, though that each structure measured here has an area of 8 mm<sup>2</sup> - for a 1 mm<sup>2</sup> structure the failure rate would be much lower, assuming the short circuits are not located on the sides of the structures. | ||
[[Image:Lesker_Impedance_Bjarke.png|600px|alt text]] | [[Image:Lesker_Impedance_Bjarke.png|600px|alt text]] | ||
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==Stress in deposited films== | ==Stress in deposited films== | ||