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Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 85: Line 85:


Multiple puddle:
Multiple puddle:
*'''DCH 100mm MP 3x60s'''
*'''(10??) DCH 100mm MP 3x60s'''
*'''(1010) DCH 100mm MP 4x60s'''
*'''(1010) DCH 100mm MP 4x60s'''
*'''(1012) DCH 100mm MP 5x60s'''
*'''(1012) DCH 100mm MP 5x60s'''
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