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Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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==Power suppliy configuration==  
==Power suppliy configuration==  


bla bla
Power supplies specification presented in a table below.


{| border="2" cellspacing="0" cellpadding="9"  
{| border="2" cellspacing="0" cellpadding="9"  
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